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Beilstein J. Nanotechnol. 2018, 9, 711–720, doi:10.3762/bjnano.9.66
Figure 1: Schematic representation of the initial orientations of (C5H4CH3)Pt(CH3)3 on 11% (Model-1 to Model-...
Figure 2: Relaxed structures of (C5H4CH3)Pt(CH3)3 on the (a, b) 11% and (c–e) 22% partially dehydroxylated su...
Figure 3: (a) Reduced supercell with the fully hydroxylated SiO2 considered for the molecular dynamics simula...
Figure 4: The configurations of (C5H4CH3)Pt(CH3)3 obtained from molecular dynamics simulations (20 ps) on (a)...
Scheme 1: Possible reaction channels for the dissociation of (C5H4CH3)Pt(CH3)3 after its interaction with par...
Figure 5: Energetics for different pathways (Path 1–3 and Path A–D) for the dissociation of precursor molecul...
Beilstein J. Nanotechnol. 2013, 4, 781–792, doi:10.3762/bjnano.4.89
Figure 1: Schematic representation of a random trajectory generated by PENELOPE [7]. The trajectory is determine...
Figure 2: Cylindrical sample geometries used in the simulations. Top: A 300 nm thick amorphous SiO2 substrate...
Figure 3: Snapshot of 50 simulated electron trajectories in the SiO2 substrate (left) and in the nanostructur...
Figure 4: Inelastic mean free paths for the relevant materials in this work presented in the usual log–log sc...
Figure 5: (a) Distribution of electrons backscattered and emitted into the vacuum from the substrate in absen...
Figure 6: Distribution of electrons backscattered and emitted into the vacuum from the substrate in the absen...
Figure 7: Energy deposited in the system as a function of the depth z for the indicated sample thicknesses dW...
Figure 8: Same as Figure 7 for a fixed deposit density (ρ = 10.6092 g/cm3) and a variable tungsten content.
Figure 9: IMFP in the different deposits with fixed density (ρ = 10.6092 g/cm3) and a variable tungsten conte...
Figure 10: Same as Figure 7 for a fixed composition (27.5% W, 50.4% C, 22.1% O) and a variable density.
Figure 11: IMFP in different deposits with fixed composition (27.5% W, 50.4% C, 22.1% O) and a variable densit...
Figure 12: Charge deposited into the system as a function of the depth z for the indicated sample thicknesses d...
Figure 13: Distribution of energy deposited in WC1.75O0.75 as a function of the depth z and the radial coordin...
Figure 14: Same as Figure 13 for the charge deposited in WC1.75O0.75.
Beilstein J. Nanotechnol. 2012, 3, 546–555, doi:10.3762/bjnano.3.63
Figure 1: (a) Optical micrograph of the Co dissociation product on the plasma-activated silica surface. The d...
Figure 2: SEM images of Co deposited on the plasma-pretreated silicon oxide and gold. The picture on the top ...
Figure 3: (a) SEM micrograph of Co deposit formed after electron pre-irradiation of the rectangular area depi...
Figure 4: (a) Temperature dependence of resistivity of Co deposit grown on the plasma-activated SiO2 surfaces...
Figure 5: (a) Top and (b) side view of DFT optimized structure of Co2(CO)8 and its frontier orbitals (c) HOMO...
Figure 6: Schematic representation of the starting configurations with possible Co2(CO)8 orientations, consid...
Figure 7: (a) Most stable structure of Co2(CO)8 on the (a) FOH-SiO2 and (b) POH-SiO2 surfaces. The molecule d...
Figure 8: Band decomposed charge density for the valence band maximum for Co2(CO)8 on the (a) FOH-SiO2 and (b...